Non-uniformity of ion bombardment
Dry etching is usually a process that combines physical and chemical effects, in which ion bombardment is an important physical etching method. During the etchin...
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1. Third-generation semiconductors
The first-generation semiconductor technology was developed based on semiconductor materials such as Si and Ge. It is the material basis for the development of tr...
We use time- and angle-resolved photoemission spectroscopy (tr-ARPES) to investigate ultrafast charge transfer in an epitaxial heterostructure made of monolayer WS2 and graphene. This heterostructu...
The origin of the name epitaxial wafer
First, let’s popularize a small concept: wafer preparation includes two major links: substrate preparation and epitaxial process. The substrate is a wafer m...