2. Epitaxial thin film growth
The substrate provides a physical support layer or conductive layer for Ga2O3 power devices. The next important layer is the channel layer or epitaxial layer used f...
Thin film deposition is to coat a layer of film on the main substrate material of the semiconductor. This film can be made of various materials, such as insulating compound silicon dioxide, semicon...
Three main types of silicon carbide polymorph
There are about 250 crystalline forms of silicon carbide. Because silicon carbide has a series of homogeneous polytypes with similar crystal structure...
Tantalum carbide coating is a commonly used surface treatment technology that can significantly improve the corrosion resistance of materials. Tantalum carbide coating can be attached to the surfac...
Metal-organic chemical vapor deposition (MOCVD) is a commonly used semiconductor epitaxy technique used to deposit multilayer films on the surface of semiconductor wafers to prepare high-quality se...
Why do graphite crucibles crack? How to solve it?
The following is a detailed analysis of the causes of cracks:
1. After the crucible is used for a long time, the crucible wall presents longitudin...