Early wet etching promoted the development of cleaning or ashing processes. Today, dry etching using plasma has become the mainstream etching process. Plasma consists of electrons, cations and radi...
According to a statement from the European Commission, the first enabling Act defines the necessary conditions for hydrogen, hydrogen-based fuels or other energy carriers to be classified as renewa...
1. As refractory material: Graphite and its products have the properties of high temperature resistance and high strength. They are mainly used in the metallurgical industry to manufacture graphite...
The SiC Coated Graphite Susceptor market report is a most important research for who looks for complete information on the SiC Coated Graphite Susceptor market. The report covers all information on...
SILICON WAFER
from sitronic
A wafer is a slice of silicon roughly 1 millimeter thick that has an extremely flat surface thanks to procedures that are technically very demanding. The subsequent use...
CVD (Chemical Vapor Deposition) is a commonly used method for preparing silicon carbide coatings. CVD silicon carbide coatings have many unique performance characteristics. This article will introd...