Chemical vapor deposition (CVD) refers to the process of depositing a solid film on the surface of a silicon wafer through a chemical reaction of a gas mixture. According to the different reaction ...
1. Main processes of plasma enhanced chemical vapor deposition
Plasma enhanced chemical vapor deposition (PECVD) is a new technology for the growth of thin films by chemical reaction of gase...
Why do graphite crucibles crack? How to solve it?
The following is a detailed analysis of the causes of cracks:
1. After the crucible is used for a long time, the crucible wall presents longitudin...
Silicon carbide nozzles play an important role in electronic semiconductor manufacturing. They are a device used to spray liquids or gases, often used for wet chemical treatment in semiconductor ma...
The “High-grade Isostatic Graphite Market” research report added to the market research report provides a brief analysis of recent market trends. In addition, the report also provides a...
CVD (Chemical Vapor Deposition) is a commonly used method for preparing silicon carbide coatings. CVD silicon carbide coatings have many unique performance characteristics. This article will introd...