CVD (Chemical Vapor Deposition) is a commonly used method for preparing silicon carbide coatings. CVD silicon carbide coatings have many unique performance characteristics. This article will introd...
1. Third-generation semiconductors
The first-generation semiconductor technology was developed based on semiconductor materials such as Si and Ge. It is the material basis for the development of tr...
Home /Automotive EVP (Electric Vacuum Pump) Market Analysis Overview, Growth Factors, Demand and Trend Forecast to 2025
This research report based on “Automotive EVP (Electric Vacuum Pump) Ma...
Modern C, N, B and other non-oxide high-tech refractory raw materials, atmospheric pressure sintered silicon carbide is extensive, economic, can be said to be emery or refractory sand. Pure silicon...
Chemical Equipment, Silicon Carbide Furnace, Graphite Furnace Special Carbon Chemical Equipment, Silicon Carbide Furnace, Graphite Furnace Dedicated Fine Structure Graphite Electrode and Square Bri...
With the gradual mass production of conductive SiC substrates, higher requirements are put forward for the stability and repeatability of the process. In particular, the control of defects, the sma...