Sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devic...
The basic process of SiC crystal growth is divided into sublimation and decomposition of raw materials at high temperature, transportation of gas phase substances under the action of temperature gr...
SIC coated stone grinding base has the characteristics of high temperature resistance, oxidation resistance, high purity, acid, alkali, salt and organic reagents, and stable physical and chemical f...
This report called “Global Carbon Mould Market” is a comprehensive document that covers valuable information about market factors, such as driving factors, constraints, competitive land...
Sintered silicon carbide is an important ceramic material, which is widely used in high temperature, high pressure and high strength fields. Reaction sintering of sic is a key step in preparing sin...
2. Epitaxial thin film growth
The substrate provides a physical support layer or conductive layer for Ga2O3 power devices. The next important layer is the channel layer or epitaxial layer used f...