chemical vapor deposition ( CVD ) is a procedure that involve lodge a solid movie on a silicon wafer’s surface through a chemical chemical reaction of a gas mixture. This procedure can be div...
According to the report on Future Trends of Hydrogen Energy released by the International Hydrogen Energy Commission, global demand for hydrogen energy will increase tenfold by 2050 and reach 520 m...
How to use silicon carbide crucible for metal purification?
The reason why silicon carbide crucible has strong practical application value is because of its common properties. Silicon carbide...
1.product presentation
The JRF-H35-01TA gas cylinder pressure relief valve is a gas supply valve specially designed for small hydrogen supply systems such as 35MPa. See Fig. 1, Figure 2 for the dev...
Chemical Vapor Deposition (CVD) is an important thin film deposition technology, often used to prepare various functional films and thin-layer materials, and is widely used in semiconductor manufac...
Wafer cutting is one of the important links in power semiconductor production. This step is designed to accurately separate individual integrated circuits or chips from semiconductor wafers.
The ke...