CVD (Chemical Vapor Deposition) is a commonly used method for preparing silicon carbide coatings. CVD silicon carbide coatings have many unique performance characteristics. This article will introd...
The bond could not be resold for interest, and the A-share market was again thundering.
On November 19, Dongxu Optoelectronics announced a debt default.
On the 19th, Dongxu Optoelectronics and Dong...
At present, many countries around all aspects of the new hydrogen research is in full swing, technical difficulties in stepping up to overcome. With the continuous expansion of the scale of hydroge...
Graphite crucible is a special laboratory tool made of graphite material. Mainly used in high temperature smelting, chemical reaction, material heat treatment and other experimental processes.
Grap...
3. Epitaxial thin film growth
The substrate provides a physical support layer or conductive layer for Ga2O3 power devices. The next important layer is the channel layer or epitaxial layer used for ...