Uyini umehluko phakathi kwe-PECVD ne-LPCVD kumishini ye-semiconductor CVD?

Ukufakwa komhwamuko wamakhemikhali (I-CVD) ibhekisela kwinqubo yokufaka ifilimu eqinile ebusweni be-siliconisilucwecwanangokusebenzisa ukusabela kwamakhemikhali kwengxube yegesi. Ngokwezimo zokusabela ezihlukene (ingcindezi, isandulela), ingahlukaniswa ngamamodeli wemishini ehlukahlukene.

Lezi zinsiza ezimbili zisetshenziselwa ziphi izinqubo?

I-PECVD(I-Plasma Enhanced) imishini eminingi futhi evame ukusetshenziswa kakhulu, esetshenziswa ku-OX, i-Nitride, isango lensimbi, i-amorphous carbon, njll.; I-LPCVD (Amandla Aphansi) ngokuvamile isetshenziswa ku-Nitride, i-poly, i-TEOS.
Siyini isimiso?
I-PECVD-inqubo ehlanganisa ngokuphelele amandla e-plasma ne-CVD. Ubuchwepheshe be-PECVD busebenzisa i-plasma enezinga lokushisa eliphansi ukuze kwenze ukuphuma kokukhanya ku-cathode yegumbi lenqubo (okungukuthi, ithreyi yesampula) ngaphansi kwengcindezi ephansi. Lokhu kuphuma kokukhanya noma enye idivayisi yokushisisa ingakhuphula izinga lokushisa lesampula libe sezingeni elinqunywe kusengaphambili, bese sethula inani elilawulwayo legesi yenqubo. Le gesi ibhekana nochungechunge lokusabela kwamakhemikhali ne-plasma, futhi ekugcineni yakha ifilimu eqinile ebusweni besampula.

I-LPCVD - I-Low-pressure chemical vapor deposition (LPCVD) iklanyelwe ukunciphisa ukucindezela kokusebenza kwegesi yokusabela ku-reactor ibe cishe ku-133Pa noma ngaphansi.

Yiziphi izici zento ngayinye?

I-PECVD - Inqubo ehlanganisa ngokugcwele amandla e-plasma kanye ne-CVD: 1) Ukusebenza kwezinga lokushisa eliphansi (ukugwema ukulimala okuphezulu kwezinga lokushisa kumishini); 2) Ukukhula kwefilimu okusheshayo; 3) Ayikhethi ngezinto zokwakha, i-OX, i-Nitride, isango lensimbi, ikhabhoni ye-amorphous ingakhula; 4) Kukhona uhlelo lokuqapha lwe-in-situ, olungalungisa iresiphi ngokusebenzisa imingcele ye-ion, izinga lokugeleza kwegesi, izinga lokushisa nokuqina kwefilimu.
I-LPCVD - Amafilimu azacile adiphozithwe yi-LPCVD azoba nokufakwa kwezinyathelo ezingcono, ukwakheka okuhle nokulawulwa kwesakhiwo, izinga eliphezulu lokumiswa kanye nokuphumayo. Ukwengeza, i-LPCVD ayidingi igesi yenkampani, ngakho-ke yehlisa kakhulu umthombo wokungcoliswa kwezinhlayiyana futhi isetshenziswa kakhulu ezimbonini ze-semiconductor ze-value-added for high film deposition.

 

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