Theknoloji ea Photolithography e shebana haholo le ho sebelisa lisebelisoa tsa optical ho pepesa lipaterone tsa potoloho ho li-wafers tsa silicon. Ho nepahala ha ts'ebetso ena ho ama ka ho toba ts'ebetso le lihlahisoa tsa lipotoloho tse kopanetsoeng. E le e 'ngoe ea lisebelisoa tse ka sehloohong tsa ho etsa li-chip, mochine oa lithography o na le likarolo tse ka bang makholo a likete. Ka bobeli likarolo tsa optical le likarolo tse ka har'a sistimi ea lithography li hloka ho nepahala ho phahameng haholo ho netefatsa ts'ebetso ea potoloho le ho nepahala.SiC ceramicsli sebelitse holi-chucksle liipone tsa ceramic square.
Wafer chuckThe wafer chuck ka har'a mochini oa lithography e jara ebe e tsamaisa sephaphatha nakong ea ts'ebetso ea ho pepeseha. Ho tsamaisana hantle pakeng tsa sephaphatha le chuck ho bohlokoa bakeng sa ho pheta mokhoa o nepahetseng holim'a sephaphatha.Sephaphatha sa SiCli-chucks li tsejoa ka boima ba tsona bo bobebe, botsitso bo phahameng ba tekanyo e phahameng le coefficient e tlase ea ho atolosa mocheso, e ka fokotsang meroalo e sa sebetseng le ho ntlafatsa ts'ebetso ea ho sisinyeha, ho beha boemo bo nepahetseng le botsitso.
Ceramic square seiponeng Mochineng oa lithography, khokahano ea motsamao lipakeng tsa wafer chuck le sethala sa mask ke ea bohlokoa, e amang ka kotloloho ho nepahala le tlhahiso ea lithography. "Square reflector" ke karolo ea bohlokoa ea "wafer chuck scanning system" e behang maikutlo, 'me litlhoko tsa eona li bobebe ebile li thata. Le hoja li-ceramics tsa silicon carbide li na le thepa e loketseng e bobebe, ho etsa likarolo tse joalo ho thata. Hajoale, baetsi ba lisebelisoa tsa potoloho tse kopaneng tsa machaba ba sebelisa haholo lisebelisoa tse kang silika e kopantsoeng le cordierite. Leha ho le joalo, ka tsoelo-pele ea theknoloji, litsebi tsa Machaena li fihletse tlhahiso ea boholo bo boholo, bo bōpehileng joaloka bo rarahaneng, bo bobebe haholo, bo kentsoeng ka ho feletseng liipone tsa silicon carbide ceramic square le likarolo tse ling tse sebetsang tsa optical bakeng sa mechine ea photolithography. Photomask, eo hape e tsejoang e le aperture, e fetisa leseli ka maske ho etsa paterone linthong tse nkang lifoto. Leha ho le joalo, ha khanya ea EUV e khantša maske, e ntša mocheso, e phahamisa mocheso ho likhato tse 600 ho isa ho tse 1000 tsa Celsius, e leng se ka bakang tšenyo ea mocheso. Ka hona, lera la filimi ea SiC hangata le beoa ho photomask. Likhamphani tse ngata tsa kantle ho naha, joalo ka ASML, joale li fana ka lifilimi tse nang le phetisetso e fetang 90% ho fokotsa tlhoekiso le tlhahlobo nakong ea ts'ebeliso ea maske le ho ntlafatsa katleho le lihlahisoa tsa mochini oa EUV photolithography.
Ho ruruha ha Plasmale Li-Photomask tsa Deposition, tse tsejoang hape e le crosshairs, li na le mosebetsi oa mantlha oa ho fetisa leseli ka maske le ho etsa paterone linthong tse nkang lifoto. Leha ho le joalo, ha khanya ea EUV (e feteletseng ea ultraviolet) e khantša sefahleho sa photomask, e ntša mocheso, e phahamisetsa mocheso ho likhato tse pakeng tsa 600 le 1000 tsa Celsius, e leng se ka bakang tšenyo ea mocheso. Ka hona, filimi ea silicon carbide (SiC) hangata e kenngoa ho photomask ho fokotsa bothata bona. Hajoale, lik'hamphani tse ngata tsa kantle ho naha, joalo ka ASML, li se li qalile ho fana ka lifilimi pepeneneng ho feta 90% ho fokotsa tlhokahalo ea ho hloekisa le ho hlahloba nakong ea ts'ebeliso ea fotomask, ka hona ho ntlafatsa katleho le tlhahiso ea lihlahisoa tsa mochini oa lithography oa EUV. . Plasma Etching leDeposition Focus Ringle tse ling Ka tlhahiso ea semiconductor, mokhoa oa ho etching o sebelisa li-etchants tsa mokelikeli kapa tsa khase (joalo ka likhase tse nang le fluorine) tse kentsoeng ka har'a plasma ho phunya sephaphatha le ho tlosa lisebelisoa tse sa batleheng ka mokhoa o ikhethileng ho fihlela mokhoa o lakatsehang oa potoloho o ntse o le teng.sephaphathabokahodimo. Ka lehlakoreng le leng, ho beoa ha filimi e tšesaane ho tšoana le lehlakore le ka morao la etching, ho sebelisoa mokhoa oa deposition ho bokella lisebelisoa tse sireletsang lipakeng tsa tšepe ho etsa filimi e tšesaane. Kaha lits'ebetso tsena ka bobeli li sebelisa theknoloji ea plasma, li na le litlamorao tse senyang likamoreng le likaroloana. Ka hona, likarolo tse ka hare ho lisebelisoa li hlokeha ho ba le khanyetso e ntle ea plasma, reactivity e tlase ho likhase tsa fluorine etching, le conductivity e tlase. Lisebelisoa tsa setso le lisebelisoa tsa ho beha, joalo ka mehele, hangata li entsoe ka thepa e kang silicon kapa quartz. Leha ho le joalo, ka tsoelo-pele ea miniaturization e kopaneng ea potoloho, tlhoko le bohlokoa ba lits'ebetso tsa etching molemong oa tlhahiso e kopaneng ea potoloho lia eketseha. Boemong ba microscopic, etching e nepahetseng ea silicon wafer e hloka plasma e matla a phahameng ho fihlela bophara ba mela e menyenyane le meaho e rarahaneng ea lisebelisoa. Ka hona, lik'hemik'hale tsa mouoane oa lik'hemik'hale (CVD) silicon carbide (SiC) butle-butle e fetohile thepa e ratoang ea ho roala bakeng sa lisebelisoa tsa ho roala le ho beha thepa ka thepa ea eona e ntle ea 'mele le lik'hemik'hale, bohloeki bo phahameng le ho tšoana. Hajoale, likarolo tsa CVD silicon carbide lisebelisoa tsa etching li kenyelletsa mehele e tsepamisitsoeng, lihlooho tsa shaoara ea khase, literei le mehele e bohale. Lisebelisoa tsa deposition, ho na le likoahelo tsa kamore, li-liner tsa kamore leLi-graphite substrates tse koahetsoeng ka SIC.
Ka lebaka la ts'ebetso ea eona e tlase le conductivity ho chlorine le likhase tsa fluorine etching,CVD silicon carbidee se e le lisebelisoa tse loketseng likarolo tse joalo ka mehele ea lisebelisoa tsa plasma etching.CVD silicon carbidelikarolo tsa lisebelisoa tsa etching li kenyelletsa mehele ea ho tsepamisa maikutlo, lihlooho tsa ho hlapa ka khase, li-trays, mehele e bohale, joalo-joalo Nka masale a lebisang tlhokomelo e le mohlala, ke likarolo tsa bohlokoa tse behiloeng ka ntle ho sephaphatha le ho kopana ka ho toba le sephaphatha. Ka ho sebelisa motlakase ho selikalikoe, plasma e tsepamisitsoe ka selikalikoe holim'a sephaphatha, ho ntlafatsa ho tšoana ha ts'ebetso. Ka tloaelo, mehele e tsepamisitsoeng e entsoe ka silicon kapa quartz. Leha ho le joalo, joalo ka ha potoloho e kopaneng ea miniaturization e ntse e tsoela pele, tlhokahalo le bohlokoa ba lits'ebetso tsa etching tlhahisong e kopaneng ea potoloho e ntse e eketseha. Litlhoko tsa matla le matla a plasma li tsoela pele ho phahama, haholo-holo lisebelisoa tsa ho eta tsa plasma (CCP), tse hlokang matla a phahameng a plasma. Ka lebaka leo, tšebeliso ea mehele ea ho tsepamisa maikutlo e entsoeng ka thepa ea silicon carbide e ntse e eketseha.
Nako ea poso: Oct-29-2024