Li-epitaxial layers li thusa lisebelisoa tsa semiconductor joang?

Tšimoloho ea lebitso la epitaxial wafer

Taba ea pele, a re phatlalatseng mohopolo o monyane: ho lokisoa ha li-wafer ho kenyelletsa likhokahano tse peli tse kholo: ho lokisoa ha substrate le ts'ebetso ea epitaxial. The substrate ke sephaphatha se entsoeng ka semiconductor single crystal material. Substrate e ka kena ka kotloloho ts'ebetsong ea ho etsa li-wafer ho hlahisa lisebelisoa tsa semiconductor, kapa e ka sebetsoa ka mekhoa ea epitaxial ho hlahisa li-wafers tsa epitaxial. Epitaxy e bua ka mokhoa oa ho hōlisa lesela le lecha la kristale e le 'ngoe holim'a substrate e le' ngoe ea kristale e 'nileng ea sebetsoa ka hloko ka ho itšeha, ho sila, ho penta joalo-joalo. lintho tse fapaneng (homogeneous) epitaxy kapa heteroepitaxy). Hobane lesela le lecha la kristale le atoloha le ho hola ho latela karolo ea kristale ea substrate, e bitsoa epitaxial layer (botenya hangata ke li-microns tse 'maloa, ho nka silicon e le mohlala: moelelo oa kholo ea silicon epitaxial e holim'a silicon e le 'ngoe. kristale substrate e nang le sebopeho se itseng sa kristale Lera la kristale le nang le bots'epehi bo botle ba lattice le botenya bo fapaneng ka mokhoa o ts'oanang oa kristale joalo ka ha substrate e ntse e hola), 'me substrate e nang le epitaxial layer e bitsoa epitaxial wafer (epitaxial wafer = epitaxial layer + substrate). Ha sesebelisoa se etsoa holim'a epitaxial layer, e bitsoa positive epitaxy. Haeba sesebelisoa se entsoe ka substrate, se bitsoa reverse epitaxy. Ka nako ena, epitaxial layer e phetha karolo ea tšehetso feela.

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0 (1)(1)Sephaphatha se bentšitsoeng

Mekhoa ea ho hōla ea Epitaxial

Molecular beam epitaxy (MBE): Ke theknoloji ea kgolo ea semiconductor epitaxial e etsoang tlas'a maemo a phahameng a vacuum. Mohlaleng ona, lisebelisoa tsa mohloli li fetoha mouoane ka mokhoa oa sepakapaka sa liathomo kapa limolek'hule ebe li kenngoa holim'a substrate ea kristale. MBE ke thekenoloji e nepahetseng haholo le e laoloang ea semiconductor e tšesaane ea kholo ea lifilimi e ka laolang ka nepo botenya ba lintho tse kentsoeng boemong ba athomo.
Metal organic CVD (MOCVD): Ts'ebetsong ea MOCVD, organic metal le hydride gas N khase e nang le likarolo tse hlokahalang li fuoa substrate ka mocheso o nepahetseng, ho etsoa karabelo ea lik'hemik'hale ho hlahisa thepa e hlokahalang ea semiconductor, 'me e beoa holim'a substrate. ka, ha metsoako e setseng le lihlahisoa tsa karabelo li lokolloa.
Vapor phase epitaxy (VPE): Vapor phase epitaxy ke theknoloji ea bohlokoa e atisang ho sebelisoa ha ho etsoa lisebelisoa tsa semiconductor. Molao-motheo oa mantlha ke ho tsamaisa mouoane oa lintho tsa motheo kapa metsoako ka khase e tsamaisang thepa, le ho beha likristale holim'a substrate ka karabelo ea lik'hemik'hale.

 

Ke mathata afe ao mokhoa oa epitaxy o a rarollang?

Ke lisebelisoa tsa kristale tse ngata feela tse ke keng tsa fihlela litlhoko tse ntseng li hola tsa ho etsa lisebelisoa tse fapaneng tsa semiconductor. Ka hona, khōlo ea epitaxial, theknoloji e nyenyane ea kristale e le 'ngoe ea ho hōla ha thepa, e ile ea ntlafatsoa qetellong ea 1959. Joale ke tlatsetso efe e khethehileng eo theknoloji ea epitaxy e nang le eona ho nts'etsopele ea thepa?

Bakeng sa silicon, ha theknoloji ea silicon epitaxial kgolo e qala, e ne e hlile e le nako e thata bakeng sa tlhahiso ea li-transistors tsa silicon tse phahameng-frequency le tse matla haholo. Ho ea ka pono ea melao-motheo ea transistor, ho fumana maqhubu a phahameng le matla a phahameng, matla a ho senyeha ha sebaka sa mokelli e tlameha ho ba holimo 'me ho hanyetsa letoto ho lokela ho ba nyenyane, ke hore, ho theoha ha matla a saturation ho lokela ho ba ho fokolang. Ea pele e hloka hore resistivity ea thepa sebakeng sa ho bokella e be e phahameng, ha e qetellang e hloka hore resistivity ea thepa sebakeng sa ho bokella e be tlaase. Liprofinse tsena tse peli lia hanyetsana. Haeba botenya ba thepa sebakeng sa mokelli bo fokotsehile ho fokotsa ho hanyetsa letoto, sephaphatha sa silicon se tla be se le tšesaane haholo 'me se fokotsehe hore se ka sebetsoa. Haeba resistivity ea thepa e fokotsehile, e tla hanana le tlhokahalo ea pele. Leha ho le joalo, tsoelo-pele ea theknoloji ea epitaxial e atlehile. rarolle bothata bona.

Tharollo: Hōlisa epitaxial layer e matla haholo holim'a substrate e hanyetsanang haholo, 'me u etse sesebelisoa ho epitaxial layer. Lera lena la epitaxial le phahameng-resistivity le etsa bonnete ba hore tube e na le matla a phahameng a ho senya, ha substrate e tlaase e hanyetsa E boetse e fokotsa khanyetso ea substrate, kahoo e fokotsa ho theoha ha matla a saturation, kahoo ho rarolla ho hanyetsana pakeng tsa tse peli.

Ho phaella moo, theknoloji ea epitaxy e kang vapor phase epitaxy le liquid phase epitaxy ea GaAs le tse ling tsa III-V, II-VI le lisebelisoa tse ling tsa limolek'hule tsa semiconductor li boetse li ntlafalitsoe haholo 'me li fetohile motheo oa lisebelisoa tse ngata tsa microwave, lisebelisoa tsa optoelectronic, matla. Ke thekenoloji ea bohlokoa ea ts'ebetso bakeng sa tlhahiso ea lisebelisoa, haholo-holo ts'ebeliso e atlehileng ea lebone la molek'hule le theknoloji ea tšepe ea mouoane oa epitaxy ka likarolo tse tšesaane, li-superlattices, liliba tsa quantum, li-superlattices tse senyehileng, le epitaxy e tšesaane ea boemo ba atomic. mohato o mocha oa lipatlisiso tsa semiconductor. Tsoelo-pele ea "boenjiniere ba mabanta a matla" tšimong e thehile motheo o tiileng.

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Lits'ebetsong tse sebetsang, lisebelisoa tse pharaletseng tsa semiconductor tsa bandgap hangata li etsoa holim'a epitaxial layer, 'me silicon carbide wafer ka boeona e sebetsa feela e le substrate. Ka hona, taolo ea lera la epitaxial ke karolo ea bohlokoa ea indasteri e pharaletseng ea semiconductor ea bandgap.

 

Tsebo e kholo ea 7 ho theknoloji ea epitaxy

1. Likarolo tse phahameng (tse tlaase) tsa ho hanyetsa li-epitaxial li ka hōlileng ka epitaxially ka li-substrates tse tlaase (tse phahameng) tsa ho hanyetsa.
2. Mofuta oa N (P) oa mofuta oa epitaxial layer o ka hōlileng ka epitaxially ho substrate ea mofuta oa P (N) ho theha PN junction ka ho toba. Ha ho na bothata ba matšeliso ha u sebelisa mokhoa oa ho hasana ho etsa PN junction holim'a substrate e le 'ngoe ea kristale.
3. E kopantsoe le theknoloji ea mask, kgolo ea epitaxial e khethang e etsoa libakeng tse khethiloeng, ho etsa maemo a ho hlahisa lipotoloho tse kopantsoeng le lisebelisoa tse nang le mehaho e khethehileng.
4. Mofuta le mahloriso a doping a ka fetoloa ho ea ka litlhoko nakong ea ts'ebetso ea ho hōla ha epitaxial. Phetoho ea ho tsepamisa mohopolo e ka ba phetoho ea tšohanyetso kapa phetoho e liehang.
5. E ka hōla metsoako e fapaneng, e nang le mefuta e mengata, e nang le likarolo tse ngata le likarolo tse ngata tse tšesaane tse nang le likarolo tse fapaneng.
6. Khōlo ea Epitaxial e ka etsoa ka mocheso o tlase ho feta ntlha ea ho qhibiliha ea thepa, tekanyo ea kgolo e khona ho laola, 'me kholo ea epitaxial ea botenya ba boemo ba athomo e ka finyelloa.
7. E ka hōlisa lisebelisoa tse le 'ngoe tsa kristale tse ke keng tsa huloa, tse kang GaN, likarolo tse le' ngoe tsa kristale tsa metsoako e phahameng le ea quaternary, joalo-joalo.


Nako ea poso: May-13-2024
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