Photolithography tekinoroji inonyanya kutarisisa pakushandisa optical masisitimu kufumura edunhu mapatani pasilicon wafers. Kururama kwemaitiro aya kunobata zvakananga kushanda uye goho remasekete akabatanidzwa. Seimwe yemidziyo yepamusoro yekugadzira chip, muchina welithography une anosvika mazana ezviuru zvezvikamu. Zvese zviri zviviri zvikamu zve optical uye zvikamu mukati meiyo lithography system zvinoda yakanyanya kurongeka kuti ive nechokwadi chekuita kwedunhu uye kurongeka.SiC ceramicsyakashandiswa muwafer chucksuye ceramic square magirazi.
Wafer chuckIyo wafer chuck mumuchina welithography inotakura uye inofambisa wafer panguva yekuratidzwa. Kunyatsorongeka pakati pewafer uye chuck kwakakosha kuti unyatso kudzokorora pateni pamusoro peiyo wafer.SiC waferchucks dzinozivikanwa nekureruka kwavo, kugadzikana kwepamusoro uye kuderera kwekuwedzera kwemafuta ekuwedzera, izvo zvinogona kuderedza inertial mitoro uye kunatsiridza kufamba kwakanaka, kumisa kurongeka uye kugadzikana.
Ceramic square mirror Mumuchina welithography, kuwiriranisa kwekufamba pakati pewafer chuck uye nhanho yemask kwakakosha, iyo inokanganisa zvakananga kurongeka kweiyo uye goho. Iyo square reflector chinhu chakakosha cheiyo wafer chuck scanning yekumisikidza mhinduro yekuyera sisitimu, uye zvayo zvenyama zvinodikanwa zvakareruka uye zvakasimba. Kunyangwe silicon carbide ceramics ine yakanaka lightweight zvivakwa, kugadzira zvinhu zvakadaro kunonetsa. Parizvino, inotungamira yepasirese yakasanganiswa yemidziyo yemagetsi vagadziri vanonyanya kushandisa zvinhu zvakaita sefused silica uye cordierite. Nekudaro, nekufambira mberi kwetekinoroji, nyanzvi dzeChinese dzakawana kugadzirwa kwehukuru-hukuru, hwakaoma-umiro, huremu huremu, hwakavharirwa zvizere nesilicon carbide ceramic square magirazi uye zvimwe zvinoshanda zve optical components for photolithography machine. Iyo photomask, inozivikanwawo seaperture, inoendesa mwenje kuburikidza nemask kuti iite pateni pane iyo photosensitive zvinhu. Nekudaro, kana EUV mwenje inovhenekera mask, inoburitsa kupisa, ichikwidza tembiricha kusvika 600 kusvika 1000 madhigirii celsius, izvo zvinogona kukonzera kukuvara kwekupisa. Naizvozvo, dhizaini yeSiC firimu inowanzoiswa pane photomask. Makambani mazhinji ekunze, akadai seASML, ave kupa mafirimu ane transmittance inopfuura 90% kuderedza kucheneswa nekuongorora panguva yekushandiswa kwephotomask uye kuvandudza mashandiro uye goho rechigadzirwa cheEUV photolithography michina.
Plasma Etchinguye Deposition Photomasks, inozivikanwawo se crosshairs, ine basa guru rekufambisa mwenje kuburikidza nemask uye kugadzira patani pane iyo photosensitive zvinhu. Nekudaro, kana EUV (yakanyanya ultraviolet) mwenje inovhenekera photomask, inoburitsa kupisa, ichikwidza tembiricha kusvika pakati pe600 ne1000 madhigirii celsius, izvo zvinogona kukonzera kukuvara kwekupisa. Nokudaro, firimu resilicon carbide (SiC) rinowanzoiswa pa photomask kuderedza dambudziko iri. Parizvino, makambani mazhinji ekunze, akadai seASML, atanga kupa mafirimu nekujeka kunopfuura 90% kuderedza kudiwa kwekuchenesa nekuongorora panguva yekushandiswa kwemafotomask, nekudaro kuvandudza kushanda uye goho rechigadzirwa cheEUV lithography michina. . Plasma Etching uyeDeposition Focus Mheteuye nevamwe Mukugadzira semiconductor, iyo etching process inoshandisa mvura kana gasi etchants (senge fluorine-ine magasi) ionized muplasma kubhomba wafer uye nekusarudza kubvisa zvinhu zvisingadiwe kudzamara yaunoda dunhu patani yasara pawaferpamusoro. Kusiyana neizvi, firimu rakatetepa rakafanana nereseri divi re etching, uchishandisa deposition nzira yekuturika zvinhu zvinodzivirira pakati pemarata akaturikidzana kuita firimu rakatetepa. Sezvo ese ari maviri maitiro anoshandisa tekinoroji yeplasma, anokonzeresa kukanganisa pamakamuri uye zvikamu. Naizvozvo, izvo zviri mukati memidziyo zvinofanirwa kuve neakanaka plasma kuramba, yakaderera reactivity kune fluorine etching magasi, uye yakaderera conductivity. Chinyakare etching uye deposition midziyo yemidziyo, senge yekutarisa mhete, inowanzo gadzirwa nezvinhu zvakaita sesilicon kana quartz. Nekudaro, nekufambira mberi kweiyo yakabatanidzwa yedunhu miniaturization, kudiwa uye kukosha kweetching maitiro muyakasanganiswa wedunhu kugadzira kuri kuwedzera. Paiyo microscopic level, chaiyo silicon wafer etching inoda yakakwira-simba plasma kuti iwane diki mutsara upamhi uye zvakanyanya kuomarara zvimiro zvemidziyo. Naizvozvo, kemikari vapor deposition (CVD) silicon carbide (SiC) zvishoma nezvishoma yave iyo yakasarudzika yekubatisa zvinhu zvekuisa uye deposition midziyo ine yakanakisa yemuviri nemakemikari zvimiro, kuchena kwepamusoro uye kufanana. Parizvino, CVD silicon carbide zvikamu mu etching midziyo zvinosanganisira mhete dzekutarisa, magasi ekugeza misoro, matireyi uye mhete mhete. Mumidziyo yekuisa, pane mavhavha emakamuri, machamber liners uyeSIC-yakavharwa graphite substrates.
Nekuda kwekuderera kwayo reactivity uye conductivity kune chlorine uye fluorine etching magasi,CVD silicon carbidechave chinhu chakanakira zvinhu zvakaita semhete dzekutarisa mumidziyo yeplasma etching.CVD silicon carbidezvikamu mumidziyo ye etching zvinosanganisira mhete dzekutarisa, magasi ekugeza misoro, matireyi, zvindori zvemupendero, etc. Tora zvindori zvekutarisa semuenzaniso, izvo zvikamu zvakakosha zvakaiswa kunze kwechimedu uye zvakanangana newafer. Nekushandisa voltage kune mhete, plasma inotariswa kuburikidza nemhete pawafer, ichivandudza kufanana kwemaitiro. Sechinyakare, mhete dzekutarisa dzakagadzirwa nesilicon kana quartz. Nekudaro, seyakasanganiswa redunhu miniaturization inofambira mberi, kudiwa uye kukosha kwekuita etching maitiro mune yakabatanidzwa redunhu kugadzira kuri kuramba kuchiwedzera. Plasma etching simba uye zvinodikanwa zvesimba zvinoramba zvichikwira, kunyanya mune capacitively yakabatana plasma (CCP) etching michina, inoda yakakwirira plasma simba. Nekuda kweizvozvo, kushandiswa kwemhete dzekutarisa dzakagadzirwa nesilicon carbide zvinhu zviri kuwedzera.
Nguva yekutumira: Oct-29-2024