Tekinoroji ya Photolithography yibanda cyane cyane ku gukoresha sisitemu ya optique kugirango yerekane imiterere yumuzunguruko kuri wafer ya silicon. Ukuri kuriki gikorwa bigira ingaruka kumikorere no gutanga umusaruro wumuzunguruko. Nka kimwe mu bikoresho byo hejuru byo gukora chip, imashini ya lithographie irimo ibice bigera ku bihumbi magana. Byombi ibice bya optique nibigize muri sisitemu ya lithographie bisaba ubuhanga buhanitse kugirango tumenye imikorere yumuzunguruko nukuri.CeramicsByakoreshejwe muriwaferindorerwamo ya ceramic.
Wafer chuckWafer chuck muri mashini ya lithographie ifite kandi yimura wafer mugihe cyo kwerekana. Guhuza neza hagati ya wafer na chuck ni ngombwa kugirango wigane neza igishushanyo hejuru ya wafer.SiC waferchucks izwiho uburemere bworoshye, butajegajega buringaniye hamwe na coefficente yo kwaguka yubushyuhe buke, bushobora kugabanya imizigo idahwitse no kunoza imikorere, guhagarara neza no guhagarara neza.
Indorerwamo ya Ceramic Mu mashini ya lithographie, guhuza ibikorwa hagati ya wafer chuck na mask ya mask ni ngombwa, bigira ingaruka ku buryo butaziguye no gutanga umusaruro. Imirasire ya kare ni ikintu cyingenzi cya wafer chuck scanning yerekana ibitekerezo byo gupima ibitekerezo, kandi ibikoresho byayo biroroshye kandi birakomeye. Nubwo silicon karbide ceramics ifite imiterere yoroheje yoroheje, gukora ibice nkibi biragoye. Kugeza ubu, abayobora ibikoresho mpuzamahanga byumuzunguruko bikoreshwa cyane cyane bakoresha ibikoresho nka silika yahujwe na cordierite. Nyamara, hamwe n’iterambere ry’ikoranabuhanga, impuguke z’Abashinwa zageze ku gukora inganda nini nini, zifite imiterere-karemano, yoroheje cyane, zifunze byuzuye indorerwamo ya silicon karbide ceramic ceramic kare hamwe nibindi bikoresho bya optique bikoresha imashini zifotora. Photomask, izwi kandi nka aperture, itanga urumuri binyuze muri mask kugirango ikore igishushanyo cyibikoresho bifotora. Nyamara, iyo urumuri rwa EUV rumurikira mask, rusohora ubushyuhe, rukazamura ubushyuhe bugera kuri dogere selisiyusi 600 kugeza 1000, bishobora kwangiza ubushyuhe. Kubwibyo, urwego rwa firime ya SiC rushyirwa kuri fotomasi. Amasosiyete menshi yo mu mahanga, nka ASML, ubu atanga firime zoherejwe hejuru ya 90% kugirango agabanye isuku nubugenzuzi mugihe cyo gukoresha fotomask no kunoza imikorere n’umusaruro w’imashini zifotora za EUV.
Indwara ya plasmana Deposition Photomasks, izwi kandi nka crosshair, ifite umurimo wingenzi wo kohereza urumuri binyuze muri mask no gukora igishushanyo cyibikoresho bifotora. Nyamara, iyo urumuri rwa EUV (ultraviolet ikabije) rumurikira fotomask, rutanga ubushyuhe, bikazamura ubushyuhe bugera kuri dogere selisiyusi 600 na 1000, bishobora gutera kwangirika kwubushyuhe. Kubwibyo, igice cya firime ya silicon karbide (SiC) isanzwe ishyirwa kuri fotomask kugirango iki kibazo gikemuke. Kugeza ubu, amasosiyete menshi yo mu mahanga, nka ASML, yatangiye gutanga filime mu mucyo urenga 90% kugira ngo agabanye gukenera isuku no kugenzurwa mu gihe cyo gukoresha fotomask, bityo bikazamura imikorere n’umusaruro w’ibikoresho by’imashini zandika za EUV . Plasma Etching naImpeta yibanzenabandi Mubikorwa bya semiconductor, inzira yo guteramo ikoresha ibinyobwa bisukuye cyangwa gaze (nka gaze irimo florine) ionisiyoneri muri plasma kugirango itere ibisasu wafer hanyuma uhitemo gukuramo ibikoresho udashaka kugeza igihe icyerekezo cyumuzunguruko kigumye kuriwaferhejuru. Ibinyuranyo, gushira firime yoroheje bisa nkuruhande rwinyuma rwo gutobora, ukoresheje uburyo bwo kubitsa kugirango ushire ibikoresho byokuzitira hagati yicyuma kugirango ukore firime yoroheje. Kubera ko inzira zombi zikoresha tekinoroji ya plasma, zikunze kugira ingaruka mbi ku byumba n'ibigize. Kubwibyo, ibice biri mubikoresho birasabwa kugira imbaraga nziza zo kurwanya plasma, kutitabira gaze ya florine, hamwe nubushobozi buke. Ibikoresho bya gakondo byo kubitsa no kubitsa, nkimpeta yibanze, mubisanzwe bikozwe mubikoresho nka silicon cyangwa quartz. Ariko, hamwe niterambere ryoguhuza miniaturizasi yumuzunguruko, icyifuzo nakamaro ko gutunganya inzira mubikorwa byuzuzanya bigenda byiyongera. Kurwego rwa microscopique, gutondeka neza silicon wafer bisaba plasma yingufu nyinshi kugirango ugere kumurongo muto wubugari nibindi bikoresho bigoye. Kubwibyo, imyuka ya chimique (CVD) silicon karbide (SiC) yahindutse buhoro buhoro ibikoresho byo gutwikira ibikoresho byo gutobora no kubitsa hamwe nibintu byiza byumubiri nubumara, ubuziranenge bwinshi kandi bumwe. Kugeza ubu, ibikoresho bya CVD silicon karbide mubikoresho byo kuriramo birimo impeta yibanze, imitwe ya gazi, tray nimpeta. Mu bikoresho byo kubitsa, hari ibifuniko bya chambre, imirongo ya chambre naSIC-yashushanyijeho igishushanyo mbonera.
Bitewe nubushobozi buke bwayo no gutwara imyuka ya chlorine na fluor,CVD silicon karbideyahindutse ibikoresho byiza kubigize nkimpeta yibanze mubikoresho bya plasma.CVD silicon karbideibice mubikoresho byo gutobora birimo impeta yibanze, imitwe ya gazi, gari ya moshi, impeta zimpande, nibindi. Fata impeta yibanze nkurugero, nibintu byingenzi byashyizwe hanze ya wafer kandi muburyo butaziguye na wafer. Mugukoresha voltage kumpeta, plasma yibanda kumpeta kuri wafer, bizamura uburinganire bwibikorwa. Ubusanzwe, impeta yibanze ikozwe muri silicon cyangwa quartz. Ariko, uko miniaturizasi yumuzunguruko igenda itera imbere, icyifuzo nakamaro ko gutunganya inzira muguhuza imiyoboro ikomeza kwiyongera. Imbaraga za plasma nimbaraga zisabwa zikomeje kwiyongera, cyane cyane mubikoresho bifata plasma (CCP) bifatanye, bisaba ingufu za plasma nyinshi. Nkigisubizo, ikoreshwa ryimpeta yibanze ikozwe mubikoresho bya silicon karbide iriyongera.
Igihe cyo kohereza: Ukwakira-29-2024