I. Kufufuza kwa parameter
1. TaCl5-C3H6-H2-Ar dongosolo
2. Kutentha kwa malo:
Malinga ndi formula ya thermodynamic, zimawerengedwa kuti kutentha kukakhala kokulirapo kuposa 1273K, mphamvu yaulere ya Gibbs ndiyotsika kwambiri ndipo momwe zimakhalira zimakwanira. Zomwe zimachitika nthawi zonse KP ndi yayikulu kwambiri pa 1273K ndipo imawonjezeka mwachangu ndi kutentha, ndipo kukula kwapang'onopang'ono kumatsika pa 1773K.
Chikoka pamwamba pa kapangidwe ka ❖ kuyanika: Pamene kutentha si koyenera (kwapamwamba kwambiri kapena kutsika kwambiri), pamwamba kumapereka mpweya waulere wa carbon morphology kapena pores otayirira.
(1) Pa kutentha kwakukulu, kuthamanga kwa ma atomu othamanga kapena magulu othamanga kwambiri, zomwe zingayambitse kugawidwa kosalinganika panthawi yosonkhanitsa zipangizo, ndipo madera olemera ndi osauka sangathe kusintha bwino, zomwe zimabweretsa pores.
(2) Pali kusiyana pakati pa pyrolysis anachita mlingo wa alkanes ndi kuchepetsa anachita mlingo wa tantalum pentachloride. Mpweya wa pyrolysis ndi wochuluka ndipo sungathe kuphatikizidwa ndi tantalum pakapita nthawi, zomwe zimapangitsa kuti pamwamba pakhale wokutidwa ndi carbon.
Pamene kutentha ndi koyenera, pamwamba paKupaka kwa TaCndi wandiweyani.
TaCparticles kusungunula ndi akaphatikizana wina ndi mzake, ndi galasi mawonekedwe wathunthu, ndipo malire a tirigu kusintha bwino.
3. Chiyerekezo cha haidrojeni:
Kuphatikiza apo, pali zinthu zambiri zomwe zimakhudza mtundu wa zokutira:
-Substrate pamwamba khalidwe
- Malo osungira gasi
- Mlingo wa kufanana kwa reactant kusanganikirana kwa gasi
II. Zolakwika zofananira zakupaka tantalum carbide
1. Kupaka kusweka ndi kusenda
Linear thermal expansion coefficient linear CTE:
2. Kusanthula zolakwika:
(1) Chifukwa:
(2) Njira yowonetsera khalidwe
① Gwiritsani ntchito ukadaulo wa X-ray diffraction kuti muyeze zovuta zotsalira.
② Gwiritsani ntchito lamulo la Hu Ke kuyerekeza kupsinjika kotsalira.
(3) Njira zofananira
3.Kupititsa patsogolo kugwirizanitsa kwamakina kwa zokutira ndi gawo lapansi
(1) Chophimba chokulirapo pamwamba pa situ
Thermal reaction deposition and diffusion technology TRD
Kusungunuka mchere ndondomeko
Sambani ntchito kupanga
Kutsitsa anachita kutentha
Kutsika mtengo
Wokonda zachilengedwe
Oyenera kupanga mafakitale akuluakulu
(2) Chophimba chosinthira chophatikizika
Co-deposition process
CVDndondomeko
Kupaka kwazinthu zambiri
Kuphatikiza ubwino wa chigawo chilichonse
Mosinthasintha kusintha ❖ kuyanika zikuchokera ndi kuchuluka
4. Thermal reaction deposition and diffusion technology TRD
(1) Njira Yochitira Zinthu
Tekinoloje ya TRD imatchedwanso embedding process, yomwe imagwiritsa ntchito boric acid-tantalum pentoxide-sodium fluoride-boron oxide-boron carbide system kukonzekera.kupaka tantalum carbide.
① Boric acid wosungunuka amasungunula tantalum pentoxide;
② Tantalum pentoxide imachepetsedwa kukhala maatomu a tantalum ndipo imafalikira pamtunda wa graphite;
③ Ma atomu a tantalum amapangidwa pamwamba pa graphite ndikuchita ndi ma atomu a kaboni kuti apangekupaka tantalum carbide.
(2) Mfungulo Yochitirapo kanthu
Mtundu wa zokutira carbide ayenera kukwaniritsa chofunika kuti makutidwe ndi okosijeni mapangidwe ufulu wa chinthu kupanga carbide ndi apamwamba kuposa boron okusayidi.
Mphamvu yaulere ya Gibbs ya carbide ndiyotsika mokwanira (kupanda kutero, boron kapena boride zitha kupangidwa).
Tantalum pentoxide ndi neutral oxide. Potentha kwambiri, borax yosungunuka imatha kuchitapo kanthu ndi mphamvu ya alkaline oxide sodium oxide kupanga sodium tantalate, potero imachepetsa kutentha komwe kumayambira.
Nthawi yotumiza: Nov-21-2024