Kedu ihe dị iche n'etiti PECVD na LPCVD na semiconductor CVD akụrụngwa?

Ntube mmiri kemịkalụ (CVD) na-ezo aka na usoro ntinye ihe nkiri siri ike n'elu siliconwafersite na mmeghachi omume kemịkalụ nke ngwakọta gas. Dị ka ọnọdụ mmeghachi omume dị iche iche (nrụgide, precursor), enwere ike kewaa ya n'ụdị ngwá ọrụ dị iche iche.

Kedu usoro eji eji ngwaọrụ abụọ a?

PECVDNgwá ọrụ (Plasma Enhanced) bụ nke kachasị ọnụ na nke a na-ejikarị eme ihe na OX, Nitride, ọnụ ụzọ ígwè, carbon amorphous, wdg; A na-ejikarị LPCVD (Ike dị ala) na Nitride, poly, TEOS.
Gịnị bụ ụkpụrụ?
PECVD-usoro na-ejikọta ike plasma na CVD n'ụzọ zuru oke. Teknụzụ PECVD na-eji plasma na-ekpo ọkụ dị ala iji mee ka mpụ na-egbuke egbuke na cathode nke ụlọ usoro (ya bụ, tray sample) n'okpuru nrụgide dị ala. Nke a na-egbuke egbuke ma ọ bụ ngwaọrụ ndị ọzọ na-ekpo ọkụ nwere ike ibuli okpomọkụ nke ihe nlele ahụ na ọkwa a kara aka, wee webata ọnụọgụ gas na-achịkwa. Nke a gas na-enweta usoro mmeghachi omume kemịkalụ na plasma, ma mesịa mepụta ihe nkiri siri ike n'elu ihe nlele ahụ.

LPCVD - Ezubere ntinye mkpuchi ikuku kemịkalụ dị ala (LPCVD) iji belata nrụgide ọrụ nke gas mmeghachi omume na reactor ruo ihe dịka 133Pa ma ọ bụ obere.

Kedu ihe njirimara nke ọ bụla?

PECVD - Usoro nke na-ejikọta ike plasma n'ụzọ zuru oke na CVD: 1) arụ ọrụ dị ala (na-ezere mmebi okpomọkụ dị elu na akụrụngwa); 2) uto ihe nkiri ngwa ngwa; 3) Ọ bụghị picky banyere ihe, OX, Nitride, metal ọnụ ụzọ ámá, amorphous carbon nwere ike niile eto; 4) Enwere usoro nleba anya n'ime ọnọdụ, nke nwere ike ịhazigharị uzommeputa site na ion parameters, gas eruba ọnụego, okpomọkụ na ihe nkiri ọkpụrụkpụ.
LPCVD - Ihe nkiri dị gịrịgịrị nke LPCVD na-edobere ga-enwe mkpuchi nzọụkwụ ka mma, njikwa nhazi na nhazi dị mma, ọnụego ntinye na mmepụta dị elu. Na mgbakwunye, LPCVD anaghị achọ gas na-ebu ibu, yabụ ọ na-ebelata isi iyi nke mmetọ ahụ ma na-ejikarị ya na ụlọ ọrụ semiconductor agbakwunyere ọnụ ahịa dị elu maka ntinye ihe nkiri dị mkpa.

 

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