Nkà na ụzụ fotolithography na-elekwasị anya na iji sistemu anya iji kpughee usoro sekit na wafer silicon. Izi ezi nke usoro a na-emetụta kpọmkwem arụmọrụ na mkpụrụ nke sekit agbakwunyere. Dịka otu n'ime akụrụngwa kachasị maka nrụpụta mgbawa, igwe lithography nwere ihe ruru narị puku kwuru puku ihe. Ma ngwa anya na ihe ndị dị n'ime usoro lithography chọrọ oke oke nkenke iji hụ na arụmọrụ sekit na izi ezi.SiC ceramicsejirila ya mee ihewafer chucksna seramiiki square mirror.
Wafer chuckNgwunye wafer na igwe lithography na-ebu ma na-ebugharị wafer n'oge usoro ikpughe. Ndozi ziri ezi n'etiti wafer na chuck dị mkpa maka ịmegharị ụkpụrụ ahụ nke ọma n'elu wafer.SiC waferA maara chucks maka ịdị arọ ha dị fechaa, nkwụsi ike dị elu na ọnụọgụ mgbasawanye ọkụ dị ala, nke nwere ike ibelata ibu inertial ma melite arụmọrụ ngagharị, idobe izi ezi na nkwụsi ike.
Ceramic square mirror Na igwe lithography, mmegharị mmegharị n'etiti wafer chuck na ihe nkpuchi dị oke mkpa, nke na-emetụta izi ezi na mkpụrụ akwụkwọ lithography ozugbo. The square reflector bụ isi akụrụngwa nke wafer chuck scanning n'ọnọdụ nzaghachi nzaghachi usoro, na ihe onwunwe chọrọ dị fechaa na siri ike. Ọ bụ ezie na ceramik silicon carbide nwere ezigbo ịdị arọ, imepụta ihe ndị dị otú ahụ siri ike. Ka ọ dị ugbu a, ndị na-emepụta ngwa sekit agbakwunyere mba ụwa na-ejikarị ihe ndị dị ka silica fused na cordierite. Otú ọ dị, site na ọganihu nke nkà na ụzụ, ndị ọkachamara na China enwetawo mmepụta nke nnukwu nha, mgbagwoju anya, nke dị arọ nke ukwuu, nke silicon carbide ceramic square enyo zuru ezu na ihe ndị ọzọ na-arụ ọrụ ngwa anya maka igwe fotolithography. Fotomask, nke a makwaara dị ka oghere, na-ebunye ọkụ site na nkpuchi iji mepụta ụkpụrụ na ihe ndị na-emetụ foto. Otú ọ dị, mgbe ọkụ EUV na-eme ka ihe mkpuchi ahụ na-egbuke egbuke, ọ na-ewepụta okpomọkụ, na-ebuli okpomọkụ ruo 600 ruo 1000 degrees Celsius, nke nwere ike imebi okpomọkụ. Ya mere, a na-edobe oyi akwa nke ihe nkiri SiC na fotomask. Ọtụtụ ụlọ ọrụ si mba ọzọ, dị ka ASML, na-enye ugbu a ihe nkiri na-ebufe ihe karịrị 90% iji belata ihicha na nyocha n'oge a na-eji fotomask ma melite arụmọrụ na mmepụta ngwaahịa nke EUV photolithography igwe.
Plasma Etchingna Deposition Photomasks, nke a makwaara dị ka crosshairs, nwere ọrụ bụ isi nke ịnyefe ọkụ site na nkpuchi na ịmepụta ụkpụrụ na ihe ndị na-ese foto. Otú ọ dị, mgbe ìhè EUV (oke ultraviolet) na-amụba fotomask, ọ na-ebute okpomọkụ, na-eme ka okpomọkụ dị n'etiti 600 na 1000 degrees Celsius, nke nwere ike imebi okpomọkụ. Ya mere, a na-edobe ihe nkiri silicon carbide (SiC) na fotomask iji belata nsogbu a. Ka ọ dị ugbu a, ọtụtụ ụlọ ọrụ si mba ọzọ, dị ka ASML, amalitela inye ihe nkiri ihe ngosi nke ihe karịrị 90% iji belata mkpa nke nhicha na nyocha n'oge a na-eji fotomask, si otú ahụ na-eme ka arụmọrụ na mmepụta ngwaahịa nke EUV lithography igwe. . Plasma Etching naMgbanaka mgbanaka mgbanakana ndị ọzọ N'ichepụta semiconductor, usoro etching na-eji mmiri mmiri ma ọ bụ gas etchants (dị ka gas nwere fluorine) ionized n'ime plasma iji tụọ wafer ahụ wee wepụ ihe ndị a na-achọghị ruo mgbe usoro sekit achọrọ ga-anọgide nawaferelu. N'ụzọ dị iche, ntinye ihe nkiri dị gịrịgịrị yiri akụkụ azụ nke etching, na-eji usoro nkwụnye ego iji kpokọta ihe mkpuchi mkpuchi n'etiti akwa ọla iji mepụta ihe nkiri dị mkpa. Ebe ọ bụ na usoro abụọ a na-eji teknụzụ plasma, ha na-enwekarị mmetụta na-emebi emebi na ụlọ na akụrụngwa. Ya mere, ihe ndị dị n'ime ngwá ọrụ ahụ kwesịrị inwe ezigbo nguzogide plasma, obere mmeghachi omume na gas fluorine etching, na obere conductivity. Ngwa etching ọdịnala na ihe nkwụnye ego, dị ka mgbanaka mgbanaka, na-ejikarị ihe dị ka silicon ma ọ bụ quartz eme ya. Agbanyeghị, na ọganihu nke miniaturization sekit agbakwunyere, ọchịchọ na mkpa nke usoro etching na nrụpụta sekit agbakwunyere na-abawanye. N'ọkwa microscopic, kpomkwem silicon wafer etching chọrọ plasma nwere ike dị elu iji nweta obosara ahịrị pere mpe yana ihe owuwu ngwaọrụ dị mgbagwoju anya. Ya mere, kemịkalụ vapor deposition (CVD) silicon carbide (SiC) ejirila nwayọọ nwayọọ bụrụ ihe mkpuchi a na-ahọrọ maka etching na ntinye akụrụngwa nwere ọmarịcha anụ ahụ na kemịkal ya, ịdị ọcha dị elu na ịdị n'otu. Ka ọ dị ugbu a, ihe ndị mejupụtara CVD silicon carbide na akụrụngwa etching gụnyere mgbanaka mgbanaka, isi mmiri ịsa gas, trays na mgbanaka ihu. N'ime akụrụngwa nkwụnye ego, e nwere mkpuchi ụlọ, ihe mkpuchi ụlọ naMkpụrụ graphite nwere mkpuchi SIC.
N'ihi obere reactivity na conductivity na chlorine na fluorine etching gas,CVD silicon carbideaghọwo ihe dị mma maka ihe ndị dị ka mgbanaka mgbanaka na plasma etching equipment.CVD silicon carbideakụrụngwa na etching akụrụngwa na-agụnye mgbanaka mgbanaka, gas ịsa isi, trays, nsọtụ yiri mgbaaka, wdg Were mgbanaka na-elekwasị anya dị ka ihe atụ, ha bụ isi components etinye n'èzí wafer na kpọmkwem kọntaktị na wafer. Site n'itinye voltaji na mgbanaka ahụ, a na-elekwasị anya na plasma site na mgbanaka ahụ na wafer, na-eme ka otu usoro ahụ dịkwuo mma. Na omenala, a na-eji silicon ma ọ bụ quartz mee mgbanaka na-elekwasị anya. Agbanyeghị, dị ka miniaturization sekit agbakwunyere na-aga n'ihu, ọchịchọ na mkpa nke usoro etching na nrụpụta sekit agbakwunyere na-aga n'ihu na-abawanye. Ike etching Plasma na ike chọrọ ka na-arị elu, ọkachasị na akụrụngwa etching plasma (CCP), nke chọrọ ike plasma dị elu. N'ihi ya, iji mgbanaka na-elekwasị anya nke ihe silicon carbide na-abawanye.
Oge nzipu: Ọktoba 29-2024