Enwere ike ịkwado mkpuchi SiC site na ntinye mmiri nke vapor (CVD), mgbanwe precursor, spraying plasma, wdg. Ihe mkpuchi nke CHEMICAL vapor deposition kwadebere bụ otu na kọmpat, ma nwee ezigbo nhazi. Na-eji methyl trichlosilane. (CHzSiCl3, MTS) dị ka isi iyi silicon, mkpuchi SiC kwadebere site na usoro CVD bụ usoro tozuru oke maka itinye mkpuchi a.
Ihe mkpuchi SiC na graphite nwere ezigbo ndakọrịta kemịkalụ, ọdịiche nke ọnụọgụ mgbasawanye ọkụ dị n'etiti ha dị ntakịrị, iji mkpuchi SiC nwere ike melite nguzogide iyi na nguzogide oxidation nke ihe graphite. N'ime ha, stoichiometric ratio, mmeghachi omume okpomọkụ, dilution gas, adịghị ọcha gas na ọnọdụ ndị ọzọ nwere mmetụta dị ukwuu na mmeghachi omume.
Oge nzipu: Sep-14-2022