Ka hoʻomoe ʻana i ka mahu kemika(CVD)ʻo ia ka ʻenehana i hoʻohana nui ʻia i ka ʻoihana semiconductor no ka waiho ʻana i nā ʻano mea like ʻole, me ka nui o nā mea insulating, ka hapa nui o nā mea metala a me nā mea metala.
ʻO CVD kahi ʻenehana hoʻomākaukau kiʻiʻoniʻoni lahilahi. ʻO kāna kumu, ʻo ia ka hoʻohana ʻana i nā precursors kinoea e hoʻoheheʻe i kekahi mau ʻāpana o ka precursor ma o nā hopena kemika ma waena o nā ʻātoma a me nā molekala, a laila hana i kahi kiʻiʻoniʻoni lahilahi ma ka substrate. ʻO nā hiʻohiʻona kumu o CVD: nā hoʻololi kemika (nā hopena kemika a i ʻole ka hoʻoheheʻe wela); ʻO nā mea a pau o ke kiʻiʻoniʻoni mai nā kumu waho; pono e komo nā reactants i ka hopena ma ke ʻano o ke kinoea.
ʻO ka haʻahaʻa haʻahaʻa haʻahaʻa kemika vapor deposition (LPCVD), plasma enhanced chemical vapor deposition (PECVD) a me ka high density plasma chemical vapor deposition (HDP-CVD) ʻekolu mau ʻenehana CVD maʻamau, he ʻokoʻa koʻikoʻi i ka waiho ʻana o nā mea, nā pono pono, nā kūlana kaʻina, etc. .
1. LPCVD (CVD Pumi Haʻahaʻa)
Kumu: He kaʻina hana CVD ma lalo o nā kūlana haʻahaʻa haʻahaʻa. ʻO kāna kumu, ʻo ia ka hoʻokomo ʻana i ke kinoea hopena i loko o ke keʻena pane ma lalo o ka momi a i ʻole ka haʻahaʻa haʻahaʻa, hoʻoheheʻe a hana i ke kinoea e ka wela kiʻekiʻe, a hana i kahi kiʻiʻoniʻoni paʻa i waiho ʻia ma ka ʻili substrate. Ma muli o ka hoʻemi haʻahaʻa haʻahaʻa i ka hui ʻana o ke kinoea a me ka turbulence, ua hoʻomaikaʻi ʻia ka kūlike a me ka maikaʻi o ke kiʻiʻoniʻoni. Hoʻohana nui ʻia ka LPCVD i ka silicon dioxide (LTO TEOS), silicon nitride (Si3N4), polysilicon (POLY), phosphosilicate glass (BSG), borophosphosilicate glass (BPSG), doped polysilicon, graphene, carbon nanotubes a me nā kiʻiʻoniʻoni ʻē aʻe.
Nā hiʻohiʻona:
▪ Ka wela o ke kaʻina hana: maʻamau ma waena o 500~900°C, ʻano kiʻekiʻe ka mahana o ke kaʻina hana;
▪ Puke kinoea: kaiapuni haʻahaʻa haʻahaʻa o 0.1 ~ 10 Torr;
▪ ʻO ka maikaʻi o ke kiʻiʻoniʻoni: maikaʻi kiʻekiʻe, kūlike maikaʻi, ʻoi aku ka maikaʻi, a me nā hemahema liʻiliʻi;
▪ Ka nui o ka waiho ʻana: ka lohi o ka waiho ʻana;
▪ Kaulike: kūpono no nā substrate nui-nui, ka waiho ʻana like ʻole;
Nā pono a me nā pōʻino:
▪ Hiki ke waiho i nā kiʻiʻoniʻoni like ʻole a paʻa;
▪ Hana maikaʻi ma luna o nā substrates nui, kūpono no ka hana nui;
▪ Ke kumukuai haahaa;
▪ He wela kiʻekiʻe, ʻaʻole kūpono i nā mea wela;
▪ Ua lohi ka hoʻopaʻa ʻana a me ka haʻahaʻa haʻahaʻa.
2. PECVD (Plasma Enhanced CVD)
Kumu: E hoʻohana i ka plasma no ka hoʻāla ʻana i nā ʻāpana kinoea i nā haʻahaʻa haʻahaʻa, e hoʻoheheʻe a hoʻoheheʻe i nā molekala i loko o ke kinoea hopena, a laila waiho i nā kiʻiʻoniʻoni lahilahi ma ka ʻili o ka substrate. Hiki i ka ikehu o ka plasma ke hoʻemi nui i ka mahana i makemake ʻia no ka pane ʻana, a loaʻa i kahi ākea o nā noi. Hiki ke hoʻomākaukau ʻia nā kiʻiʻoniʻoni metala like ʻole, nā kiʻiʻoniʻoni inorganic a me nā kiʻiʻoniʻoni.
Nā hiʻohiʻona:
▪ Ka mahana hana: maʻamau ma waena o 200~400°C, haʻahaʻa ka mahana;
▪ Ka nui o ke kaomi kinoea: maʻa mau haneli mTorr i kekahi Torr;
▪ ʻO ka maikaʻi o ke kiʻiʻoniʻoni: ʻoiai he maikaʻi ke ʻano like ʻole o ke kiʻiʻoniʻoni, ʻaʻole maikaʻi ka nui a me ka maikaʻi o ke kiʻiʻoniʻoni e like me ka LPCVD ma muli o nā hemahema i hoʻokomo ʻia e ka plasma;
▪ Ka nui o ka waiho ʻana: kiʻekiʻe, kiʻekiʻe ka hana hana;
▪ Kaulike: haʻahaʻa iki i ka LPCVD ma nā substrate nui;
Nā pono a me nā pōʻino:
▪ Hiki ke waiho ʻia nā kiʻiʻoniʻoni lahilahi ma nā haʻahaʻa haʻahaʻa, kūpono i nā mea wela;
▪ Ka wikiwiki o ka waiho ʻana, kūpono no ka hana pono;
▪ ʻO ke kaʻina hana maʻalahi, hiki ke mālama ʻia nā waiwai kiʻiʻoniʻoni ma ka hoʻoponopono ʻana i nā ʻāpana plasma;
▪ Hiki i ka plasma ke hoʻokomo i nā hemahema kiʻiʻoniʻoni e like me nā pinholes a i ʻole like ʻole;
▪ Ke hoʻohālikelike ʻia me LPCVD, ʻoi aku ka ʻino o ke kiʻiʻoniʻoni a me ka maikaʻi.
3. HDP-CVD (High Density Plasma CVD)
Kumu: He ʻenehana PECVD kūikawā. Hiki i ka HDP-CVD (i ʻike ʻia ʻo ICP-CVD) ke hoʻohua i ka plasma kiʻekiʻe a me ka maikaʻi ma mua o nā lako PECVD kuʻuna ma nā haʻahaʻa haʻahaʻa haʻahaʻa. Eia kekahi, hāʻawi ʻo HDP-CVD i kahi ion flux kūʻokoʻa a me ka mana o ka ikehu, hoʻomaikaʻi i ka ʻauwaha a i ʻole ka puka hoʻopiha piha no ke koi ʻana i ka hoʻopaʻa kiʻiʻoniʻoni, e like me nā uhi anti-reflective, haʻahaʻa haʻahaʻa haʻahaʻa deposition mau mea, etc.
Nā hiʻohiʻona:
▪ Ka mahana wela: lumi wela a hiki i 300 ℃, haʻahaʻa loa ka mahana o ke kaʻina hana;
▪ Ka nui o ke kaomi kinoea: ma waena o 1 a me 100 mTorr, haʻahaʻa ma mua o PECVD;
▪ ʻO ke kiʻi kiʻiʻoniʻoni: kiʻekiʻe plasma density, kiʻekiʻe kiʻiʻoniʻoni maikaʻi, kūlike maikaʻi;
▪ Ka nui o ka waiho ʻana: aia ka nui o ka waiho ʻana ma waena o LPCVD a me PECVD, ʻoi aku ka kiʻekiʻe ma mua o ka LPCVD;
▪ Kaulike: ma muli o ka plasma kiʻekiʻe, ʻoi aku ka maikaʻi o ka like ʻana o ke kiʻiʻoniʻoni, kūpono no nā ʻano substrate paʻakikī;
Nā pono a me nā pōʻino:
▪ Hiki ke waiho i nā kiʻiʻoniʻoni kiʻekiʻe ma nā mahana haʻahaʻa, kūpono loa i nā mea wela;
▪ ʻO ke kūlike kiʻiʻoniʻoni maikaʻi loa, ka nui a me ka laumania o ka ʻili;
▪ ʻOi aku ka nui o ka plasma density e hoʻomaikaʻi i ka like ʻana o ka waiho ʻana a me nā waiwai kiʻiʻoniʻoni;
▪ ʻO nā mea hana paʻakikī a me ke kumukūʻai kiʻekiʻe;
▪ Ua lohi ka wikiwiki o ka waiho ʻana, a hiki i ka ikehu plasma kiʻekiʻe ke hoʻokomo i kahi pōʻino liʻiliʻi.
Welina mai i nā mea kūʻai mai a puni ka honua e kipa mai iā mākou no kahi kūkākūkā hou aku!
https://www.vet-china.com/
https://www.facebook.com/people/Ningbo-Miami-Advanced-Material-Technology-Co-Ltd/100085673110923/
https://www.linkedin.com/company/100890232/admin/page-posts/published/
https://www.youtube.com/@user-oo9nl2qp6j
Ka manawa hoʻouna: Dec-03-2024