Silicon Carbide Wafer Disc shine maɓalli mai mahimmanci da aka yi amfani da shi a cikin matakai daban-daban na masana'antu na semiconductor. muna amfani da fasahar mu ta ƙwaƙƙwaran don sanya faifan silicon carbide mafi aminci tare da tsaftar tsafta, ingantaccen suturar sutura da kyakkyawar rayuwar sabis, kazalika da juriya na sinadarai da kaddarorin kwanciyar hankali na thermal.
VET Energy shine ainihin masana'anta na samfuran graphite na musamman da samfuran silicon carbide tare da sutura daban-daban kamar SiC, TaC, carbon pyrolytic, gilashin-carbon, da sauransu, na iya samar da sassa daban-daban na musamman don semiconductor da masana'antar hotovoltaic. Ƙungiyarmu ta fasaha ta fito ne daga manyan cibiyoyin bincike na gida, za su iya samar da ƙarin ƙwararrun kayan aiki don ku.
Muna ci gaba da haɓaka matakai na ci gaba don samar da ƙarin kayan haɓaka, kuma mun yi aiki da fasaha ta keɓance mai ƙima, wanda zai iya sanya haɗin kai tsakanin shafi da abin da ke ƙasa ya fi ƙarfin kuma ba shi da haɗari ga ɓarna.
FAbincin samfuranmu:
1. High zafin jiki oxidation juriya har zuwa 1700℃.
2. Tsafta mai girma dathermal uniformity
3. Excellent lalata juriya: acid, alkali, gishiri da kuma Organic reagents.
4. Babban taurin, m surface, lafiya barbashi.
5. Tsawon rayuwar sabis kuma mafi dorewa
CVD SiC薄膜基本物理性能 Asalin kaddarorin jiki na CVD SiCshafi | |
性质 / Dukiya | 典型数值 / Yawan Daraja |
晶体结构 / Tsarin Crystal | FCC β lokaci多晶,主要为(111) 取向 |
密度 / Yawan yawa | 3.21g/cm³ |
硬度 / Tauri | 2500 维氏硬度 (500g kaya) |
晶粒大小 / Hatsi SiZe | 2 ~ 10 μm |
纯度 / Sinadaran Tsabta | 99.99995% |
热容 / Ƙarfin zafi | 640kg-1· K-1 |
升华温度 / Sublimation Zazzabi | 2700 ℃ |
抗弯强度 / Ƙarfin Flexural | 415 MPa RT 4-point |
杨氏模量 / Matasa Modul | 430 Gpa 4pt lankwasa, 1300 ℃ |
导热系数 / ThermalGudanarwa | 300 w·m-1· K-1 |
热膨胀系数 / Fadada thermal (CTE) | 4.5×10-6K-1 |
Barka da zuwa ziyarci masana'antar mu, bari mu kara tattaunawa!